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Suzhou Cse Semiconductor Equipment Technology

Company Summary:

  • Since 2008
  • 51-75 Employees
  • Turnover 10,000,000.00 USD per year
  • 35% turn over from existing products
  • 50 year(s) of Export Experience
  • Sole Proprietorship

Additional Contacts:

http://www.hlcas.com
Export Department
Lily Wang
Phone: 86 - 513 - 87733268/86 - 18112237969
Fax: 86 - 513 - 87733268

Company Address:

No.90,Taoxin RD.,Taoyuan Town,Rugao City,Jiangsu Province,China
Rugao, jiangsu
China, 226513
Web Page Link: http://www.toboc.com/suzhoucsesemiconductorequipmenttechnology

Products

Listing 1 to 23 of 23 result(s)
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LCD Cleaning Equipments before Pi(non-standard ...  

[ Product #: CSE-FC09-DNX]

1. Summary of equipmentThis equipment is used for cleaning subst`rate by washing, spray, air knife and for removing moisture by IR,UV. so as to improve the wettability of the subst`rate surface,cooling the subst`rate temperature by subsequent TBL into the COAT device.Feeder, TBL, blanker and other e

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Wafer developing machine   

[ Product #: CSE-SC09-NSX]

The device name: silicon developing machine which is mainly used for developing and fixing on the silicon wafer in semiconductor technology.Dimensions: length 3200mm width 1700mm height 1780mmFeatures: 1.The equipment is composed of five parts: the cleaning tank parts, laminar flow purification syst

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LCD etching equipments   

[ Product #: CSE-FC09-DWX]

The device name: LCD etching equipment which is suitable for wet chemical etching on the subst`rate surrounding in LCD process.Dimensions: length 8000mm width 1780mm height 1900mmShell material:Germany imported PP plateProduct features:1.Reliable control system and visual interface2.Can provide non

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LCD/PDP/OLED cleaning machine   

[ Product #: CSE-FC09-DEX]

LCD/PDP/OLED cleaning machine and cleaning agent is mainly uesed for ITO/Cr glass cleaning the surface of the glass subst`rate by lotion spray, roller brush, spray cleaning, ultrasonic cleaning, wind knife drying, ultraviolet radiation and other meth`ods. Device:1.Feeder2.Transmission device3.Lotion

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Cleaning & texturing equipment   

[ Product #: CSE-SL09-SSX]

Equipment: 1)Mainly used for textured etching and cleaning of single or polycrystal`line silicon solar cell before production and diffusion .2)Process: feeding, corrosion of HF+HNO3 ? QDR+N2 bubbling+spray? KOH corrosion + QDR+N2 bubbling +spray ?HCI corrosion ? QDR+N2 bubbling+ spray , blanking, c

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Wafer pre cleaning machine   

[ Product #: CSE-SL09-SUX]

Body material:Germany imported porcelain white PP board that is bended and welded after sculptured.1.The device is composed of five parts: the cleaning slot,the servo system and the mechanical arm, laminar flow purification system, electrical control system, the frame and the whole machine.2.Cleanin

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Cleaning Equipment after Slicing   

[ Product #: CSE-SC09-NFX]

Name: slice cleaning equipmentUse: This equipment is mainly used for cleaning and drying after processing of silicon slices.Specifications: length 3200mm width 1300mm height 1800mmMain material: stainless steel 316 Product features: 1 cleaning device is mainly composed of a cleaning body, tank, exha

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removing of photoresist cleaning table   

[ Product #: CSE-SC09-MBX]

Features: (1) each slot can clean 2 baskets at the same time. The device has the advantages of beautiful appearance, acid good performance, convenient operation, reliable operation, is the idal silicon cleaning equipment in semiconductor production line.(2) the device is composed of machine frame p

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Automatic silicon cleaning machine   

[ Product #: CSE-SL09-SDX]

Name : automatic silicon cleaning machineUses: the main function is to carry out cleaning and drying treatment on polysilicon chunk in silicon material industry.Dimensions: length 7280mm width 1500mm height 3160mmMain material: body material: Germany imported material 10mm NPP The frame body adopt

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Silicon rod cleaning machine   

[ Product #: CSE-SL09-SDX]

Silicon rod cleaning machine1.Process:Manually feeding, corrosion, water washing,overflow rinsing, ultrasound + heating, and hot nitrogen,vacuum drying, manually blanking.2.Silicon rod size: Φ125~140mm& 215(2000~2800mm)3.Size of square silicon rod:Silicon 156x156x220mm4.Silicon core size: Φ7~10mm&

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Developing and Cleaning Machine   

[ Product #: CSE-SC09-NSX]

1 Overview: This equipment can be used for developing and fixing on 2 "~8" silicon in semiconductor technology which has advanced technology, strong consistency,applicable to the scale of production.2 Material of whole equipment are imported.3 The equipment has the double grooves, each row of 7 t

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Semiconductor Etching Equipments   

[ Product #: CSE-SC09-NUX]

Semiconductor etching machine (semi automatic) (non-standard equipment) General description:suitable for etching of 2 "- 8" wafer.Conversion between corrosion grooves and cleaning groove is driven by imported SEW1.Object: wafer cleaning2 (1)the ultrasonic cleaning, heating cleaning for single slot

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Etching and Cleaning Machine   

[ Product #: CSE-SC09-NUX]

1 process feeding, spray, etching, rinsing, etching, spray,blanking2.Conversion between etching bath and washing is finished by imported SEW driven mechanical hand, to quickly realize the wafer conversion between the two groove silicon.3 Corrosion groove is equipped with American PTFE heater, temp

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Wafer Drying Machine   

[ Product #: CSE-SC09-MUX]

Equipment overview: Wafer drying machine has high cleanliness spin rinsedry function. Mainly used for silicon wafer, reticle, solar cells and other similar materials washing drying. Structure: Working cavity structure, the largest processing diameter150mm. S is a double cassette structure system con

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Fully Automatic Quartz Tube Cleaning Machine   

[ Product #: CSE-SC09-NKX]

This equipment is immersion cleaning machine. mainly used for quartz tube which is used in diffusion and extension equipment and silicon carbide tube 1.The whole equipment using the German magnetic white polypropylene plate (PP) welded with Germany welding equipmentand .2.The equipment consists

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Vertical Quartz Tube Cleaning Machine   

[ Product #: CSE-SC09-MJX]

Use: suitable for quartz and quartz tube of diameter 255cm , length 3300cm or smaller in semiconductor, solar energy industry Size: the entire equipment using the German magnetic white polypropylene plate, (PP) welded with Germany welding equipmentProduct features: 1.This equipment is not only us

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Plate Type Silicon Wafer Cleaning Machine   

[ Product #: CSE-SC09-NKX]

the cleaning object is 2 to 8 inches of grinding silicon wafer. The whole equipment controlled by imported PLC. Through setting the work rhythm, transmission rack after each process, starting from material to material are done automatically. Equipment work rhythm, the parameters set by the touch scr

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Wafer Cleaning Equipment(Nonstandard Equipment)   

[ Product #: CSE-SC09-NGX]

Application: widely used in wet chemical process of chip in IC production and semiconductor components productionUtility:the device can effectively remove organic pollutants, the wafer surface particles, metal impurities,the natural oxide layer and quartz, plastic and other accessory vessels, and

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Wet Bench   

[ Product #: CSE-SC09-NKX]

Wet Bench Application: Developing Process Etching Process Strip`ping Process Cleaning Process Mask Cleaner Suitable Size:2"-8" Wafer Product Type:Wet Bench or Wet station Operation Mode:Auto / Semi-Auto / Manual Specialty:Build-to-order available Available Option: Class 100 or 1000 CIM Connect Chemi

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Auto Wafer Wet bench   

[ Product #: CSE-SC09-NKX]

Applied in wafer wet chemical processing in semiconductor industry,including cleaning,etching,drying. developing,electroplating and strip`ping.It can be customised based on individual requirements.Various options are available to meet your process and standard.Advantages:*Module designDepending on c

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Silicon Materials/Silicon Ingots/Silicon Rods C...  

[ Product #: CSE-SL09-SDX]

Used in Silicon Materials/Silicon Ingots/Silicon Rods wet chemical processing in Solar Photovoltaic industry, including cleaning,etching,drying.It can be designed as customer required.Various options are available to meet customers process and standard. Advantages: Module designDepending on customer

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Nitrogen-Purged Storage Systems   

[ Product #: CSE-LL09-TYX]

Offer a complete line of desiccators specially configured to the requirements of the semiconductor, electronics, solar photovoltaic.FPD and other industriesNitrogen-purged desiccators maintain low relative humidity levels, down to 0 PercentRH. Advanced lines of relative humidity control systems auto

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IPA vapor drying equipment   

[ Product #: CSE-SC09-OSX]

IPA vapor drying equipmentWorking principle: fill process tank with water, put the wafer basket into the special support of tank, the tank will be covered automatically by cylinder , back cover of trough is provided with a heat N2 jet holes and IPA jet hole, DIW in groove is discharged, at the

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Listing 1 to 23 of 23 result(s)
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