Suzhou Cse Semiconductor Equipment Technology

Wet Bench

Wet Bench Application: Developing Process Etching Process Strip`ping Process Cleaning Process Mask Cleaner Suitable Size:2"-8" Wafer Product Type:Wet Bench or Wet station Operation Mode:Auto / Semi-Auto / Manual Specialty:Build-to-order available Available Option: Class 100 or 1000 CIM Connect Chemical Supply System CO2 / IR PLC / PC Base / PAC Datalogic Temperature Measurement Data Acquisition System Product Feature: Use quality pipe and valve component Use PLC for electronic controller Robotic horizontal and vertical stroke for high accuracy, stability and positioning Quarantine zone for both acidic gas and electrical subst`ance Flexible disposition scheme for QDR Modularized pipeline installment allows swift and convenient maintenance Product design is highly adaptable to fit in customized environment according to the actual needs CSE’s batch wet process systems, wet stations and wet benches are designed for silicon etch, wafer cleaning, and wafer strip`ping for wafers from 100 mm up to 250 mm, and include fully automatic, semi-automatic and manual options, with a choice of linear and rotary robotics. We has a solution to meet most wet etching, wet process, parts cleaning and wafer cleaning needs.

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