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China New Metal Materials Technology Co.,Ltd

Company Summary:

  • Since 2010
  • 51-75 Employees
  • Turnover 750,000.00 USD per year
  • 60% turn over from existing products
  • Limited Company

Additional Contacts:

www.85162188.com
Export Department
Wendy Wen
Phone: +86 - 010 - 85162188/+86 - 13691555442
Fax: +86 - 010 - 86-010-85162988

Company Address:

Qinghe Zhongguancun Yongtai Innovation Park A-320, Haidian District, Beijing, China
Beijing, Beijing
China, 100192
Web Page Link: http://www.toboc.com/chinanewmetalmaterialstechnologycoltd

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Details of Product or Sell Offer
product

High purity Mo, Fe, Ni, Pt, Bi, V

"High purity Mo, Fe, Ni, Pt, Bi, V" is listed under  Magnetic Materials Category

CNM could provide high quality target material for the field of electrical and semiconductor devices, flat panel display, architectural and automotive glass, thin film solar cell, magnetic storage, instrument, decorate thin film, etc. High pure metal spu ttering target: Al, Cr, Cu, Ni, Si, Ge, Nb, Ti, In, Ag, Sn, graphite, Ta, Mo, Au, Hf, Mn, Zr, Mg, Zn, Pb, Ir, Y, Ce, La, Yb, Gd, pt Target High density ceramic sputtering target: ITO target, AZO target,IGZO target, MgO, Y2O3, Fe2O3, Ni2O3, Cr2O3, ZnO, ZnS, CdS, MoS2, SiO2, SiO, ZrO2, Nb2O5, TiO2, HfO2, TiB2, ZrB2, WO3, Al2O3, Ta2O5, MgF2, ZnSe, AlN, Si3N4, BN,TiN, SiC, LiNbO3, BaTiO3, LaTiO3, PrTiO3 target, etc. Note: The ceramic target produced in CNM adopts the most advanced ceramic production tech nology-inert gas protection hot isostatic pressing sintering technology, the relative density is grater than 95-99%. In addition, CNM could provide with the metalizing process of the target and unbounded services. High pure alloy sputtering target: Ni-V Alloy target, Ni-Cr target, Ti-Al Alloy target, Si-Al Alloy target, Cu-Im Alloy target, Cu-Ga Alloy target, Cu-Im-Ga Alloy target, Cu-Im-Ga-Se Alloy target, stainless steel target, Zn-Al Alloy target,W-Ti Alloy target, Fe-Co Alloy target, etc Note: CNM p roduce high purity Alloy sputtering target: tiny grain size number (150-60um), high relative density (99-99.9%), high purity (99.9-99.999%). In addition, CNM provides with the metalizing process of the target materials and unbounded services. Vacuum c oating material Evaporation materials For complex film, color film, anti-reflection film, ultraviolet coating, air-sensitive sensor coating, high temperature dielectric coating, optical film, laser aid filter, preservative, transparent conducting film, discolor film, good wide band anti-reflection film, ferromagnetic film, visible region anti-reflection, infrared anti-reflection film, spectro-film, multilayer film, high reflectance coating, resistive film, high temperature reflectance coating, cold ligh t coating. High quality vacuum coating material: 4N-5N 1. Oxide: SiO, SiO2, TiO2, ZrO2, HfO2, TiO, Ti3O5, Nb2O5, Ta2O5, Y2O3 etc. high purity Oxide coating materials. 2. fluoride: NbF3, BaF2, CeF3, MgF2, LaF3, YF3, YbF3, ErF3 etc. high purity Fluoride coating materials. 3. other compound: ZnS, ZnSe, TiN, SiC, LaTiO3, BaTiO3, SrTiO3, PrTiO3,CdS etc. other compounds vacuum coating materials. 4. metal coating material: high pure Al, Cu, Ti, Si, Au, Ag, Im, Mg, Zn, Pt, Ge, Ni, Au-Ge Alloy, Au-Ni Alloy, N i-Cr Alloy, Ti-Al Alloy, Cu-Im-Ga Alloy, Ci-Im-Ga-Se Alloy, Zn-Al Alloy, etc. Metal coating materials. Note: the vacuum coating materials produced by CNM boasts the following advantages: high purity, no spilling, low deflation, well-distributed film, str ong adhesion, better resistance to corrosion, uniform color, and so on.



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sputtering target, rare earth, evaporation materials
#sputteringtarget, #rareearth, #evaporationmaterials

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