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China Material Technology Co,.Ltd.

Company Summary:

  • Since 2008
  • 76-100 Employees
  • Turnover 300,000.00 USD per year
  • 50% turn over from existing products
  • 5 year(s) of Export Experience
  • Limited Company

Additional Contacts:

www.mat-cn.com
Export Department
Yolanda Yuan
Phone: 86 - 791 - 88165996/86 - 18907095592
Fax: 86 - 791 - 88165992

Company Address:

589 GaoXin Road,NanChang Hi-Tech Industry Development Zone
Nanchagn, Jiangxi
China, 330096
Web Page Link: http://www.toboc.com/chinamaterialtechnologycoltd771839

Products

Listing 1 to 25 of 36 result(s)
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AlMgB14 target-Aluminum-magnesium boron target-...  

[ Product #: 1]

AlMgB14 target (MAT-CN)Physical properties ColorblackDensity-g/m& 179Melting point-Technical indicators purity99.99 PercentRelative density>99.9 PercentCut surface flatness3.2RaTolerance& 1770.1mmgrain sizeuniformMaterial AlMgB14Brand MAT-CNOrigin Nanchang Jiangxi ChinaSpecifications Size 1: diamet

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CdS target binding welding -CdS target--sputter...  

[ Product #: 2]

CdS target (MAT-CN)Physical properties ColorGOLDDensity-g/m& 179Melting point-Technical indicators purity99.99 PercentRelative density>99.9 PercentCut surface flatness3.2RaTolerance& 1770.1mmgrain sizeuniformMaterial CdSBrand MAT-CNOrigin Nanchang Jiangxi ChinaSpecifications Size 1: diameter <360mm

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High density and high uniformity Al2O3 target-...  

[ Product #: 3]

AL2O3 target target (MAT-CN)Physical properties ColorsilverDensity-g/m& 179Melting point-Technical indicators purity99.99 PercentRelative density>99.9 PercentCut surface flatness3.2RaTolerance& 1770.1mmgrain sizeuniformMaterial al2o3Brand MAT-CNOrigin Nanchang Jiangxi ChinaSpecifications Size 1: di

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CuInGaSe target-Copper indium gallium selenide ...  

[ Product #: 4]

CuInGaSe target (MAT-CN)Physical properties ColorblackDensity-g/m& 179Melting point-Technical indicators purity99.99 PercentRelative density>99.9 PercentCut surface flatness3.2RaTolerance& 1770.1mmgrain sizeuniformMaterial CuInGaSeBrand MAT-CNOrigin Nanchang Jiangxi ChinaSpecifications Size 1: diam

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sputtering target ITO (bonding Cu)99.99% virtua...  

[ Product #: 5]

ITO(In2O3+SnO2) target 99.99 Percent Physical propertiesColorGrayDensity7.14g/ml Melting point1500-1900Technical indicatorspurity99.99 Percent Relative density>99 Percent Cut surface flatness3.2RaTolerance& 1770.1mmgrain size uniform Material ITO (In2O3+SnO2)Brand MAT-CN Origin Nanchang Jiangxi Spec

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The RF sputtering target Cesium Cs pieces / vir...  

Cesium Cs/TREM99.9 Percent TREM99.5 PercentPhysical propertiesColorSilver goldDensity1.873g/mlMelting point28.55Technical indicatorspurityCs/TREM99.9 PercentTREM99.5 PercentRelative density>99 PercentCut surface flatness3.2RaTolerance& 1770.1mmgrain sizeuniform

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Molybdenum Mo sputtering target/ virtual price   

Mo target(Mat-cn)Physical propertiesColorsilverDensity10.22g/m& 179Melting point2617Technical indicatorspurity99.95 PercentRelative density>99 PercentCut surface flatness3.2RaTolerance& 1770.1mmgrain sizeuniform

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AZO target-Zinc oxide doped alumina target-sput...  

AZO target (MAT-CN)Physical properties ColorsilverDensity-g/m& 179Melting point-Technical indicators purity99.99 PercentRelative density>99.9 PercentCut surface flatness3.2RaTolerance& 1770.1mmgrain sizeuniform

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Zinc Zn sputtering target / virtual price   

Zinc target(Mat-cn)Physical propertiesColorsilverDensity7.13g/m& 179Melting point420Technical indicatorspurity99.99 PercentRelative density>99 PercentCut surface flatness3.2RaTolerance& 1770.1mmgrain sizeuniform

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Hi-purity Ti Titanium sputtering target/ virtua...  

Ti target Titanium target(Mat-cn)Physical propertiesColorsilverDensity4.51g/m& 179Melting point1660Technical indicatorspurity99.99 PercentRelative density>99 PercentCut surface flatness3.2RaTolerance& 1770.1mmgrain sizeuniform

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sputtering target Aluminum Al/virtual price   

Al target Aluminum target(Mat-cn)Physical propertiesColorsilverDensity2.7g/m& 179Melting point661Technical indicatorspurity99.99 PercentRelative density>99 PercentCut surface flatness3.2RaTolerance& 1770.1mmgrain sizeuniform

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Ion beam sputtering powder Yttrium(MAT-CN)   

Y powder 99.9 PercentPhysical propertiesColorGray and BlackDensity4.47g/mlMelting point1526Technical indicatorspurity99.9 PercentRelative density>99 PercentCut surface flatness3.2RaTolerance& 1770.1mmgrain sizeuniform

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High density and high uniformity C target 99.99...  

C target Carbon target (MAT-CN)Physical properties ColorblackDensity2.26g/m& 179Melting point3500Technical indicators purity99.99 PercentRelative density>99.9 PercentCut surface flatness3.2RaTolerance& 1770.1mmgrain sizeuniform

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Flat CuNiIn-Copper-nickel indium-sputtering ta...  

CuNiIn target Copper-nickel indium target (MAT-CN)Physical properties ColorsilverDensity-g/m& 179Melting point-Technical indicators purity99.99 PercentRelative density>99.9 PercentCut surface flatness3.2RaTolerance& 1770.1mmgrain sizeuniform

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CuCr target Copper-chromium sputtering target /...  

CuCr target Copper-chromium target (MAT-CN)Physical properties ColorsilverDensity-g/m& 179Melting point-Technical indicators purity99.99 PercentRelative density>99.9 PercentCut surface flatness3.2RaTolerance& 1770.1mmgrain sizeuniform

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High purity Sputtering target ---- LiF target ...  

[ Product #: 1]

LiF target Lithium Fluorine target(Mat-cn) Physical properties Color white Density 2.64g/m& 179 Melting point 848 Technical indicators purity 99.99 Percent Relative density >99 Percent Cut surface flatness 3.2Ra Tolerance 0.1mm grain size uniform

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The finishing surface CuNiMn target-Copper-nick...  

[ Product #: 2]

CuNiMn target Copper-nickel fierce target (MAT-CN)Physical properties ColorsilverDensity-g/m& 179Melting point-Technical indicators purity99.9 PercentRelative density>99.9 PercentCut surface flatness3.2RaTolerance& 1770.1mmgrain sizeuniform

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sputtering target ATO 99.99% virtual price   

[ Product #: 3]

ATO(Sb2O3+SnO2) target 99.99 PercentPhysical propertiesColorBlueDensity2.0g/mlMelting point/Technical indicatorspurity99.99 PercentRelative density>99 PercentCut surface flatness3.2RaTolerance& 1770.1mmgrain sizeuniform

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CuGa sputtering target / virtual price   

[ Product #: 4]

CuGa target 99.99 PercentPhysical propertiesColorSilvery whiteDensity_Melting point_Technical indicatorspurity99.99 PercentRelative density>99 PercentCut surface flatness3.2RaTolerance& 1770.1mmgrain sizeuniform

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The finishing surface CuCr Copper-chromium-sput...  

[ Product #: 5]

CuCr target Copper-chromium target (MAT-CN)Physical properties ColorsilverDensity-g/m& 179Melting point-Technical indicators purity99.99 PercentRelative density>99.9 PercentCut surface flatness3.2RaTolerance& 1770.1mmgrain sizeuniform

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The asymmetric pulse sputtering CrMn target(MAT...  

[ Product #: 6]

CrMn target 99.9 PercentPhysical propertiesColorsilvery whiteDensity_Melting point_Technical indicatorspurity99.9 PercentRelative density>99 PercentCut surface flatness3.2RaTolerance& 1770.1mmgrain sizeuniform

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Gold taget for magnetic data storage 99.99%-Au ...  

[ Product #: 7]

Au target Gold target(Mat-cn)Physical propertiesColorGoldDensity19.32g/m& 179Melting point1064Technical indicatorspurity99.99 PercentRelative density>99 PercentCut surface flatness3.2RaTolerance& 1770.1mmgrain sizeuniform

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sputtering target Sliver Ag /virtual price   

[ Product #: 8]

Ag target Sliver target(Mat-cn)Physical propertiesColorsilverDensity10.5g/m& 179Melting point961Technical indicatorspurity99.99 PercentRelative density>99 PercentCut surface flatness3.2RaTolerance& 1770.1mmgrain sizeuniform

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Reactive magnetron sputtering Ni target99.99%- ...  

[ Product #: 9]

Ni target(Mat-cn)Physical propertiesColorsilverDensity8.9g/m& 179Melting point1453Technical indicatorspurity99.999 PercentRelative density>99 PercentCut surface flatness3.2RaTolerance& 1770.1mmgrain sizeuniform

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wolfram sputtering target W/ virtual price   

[ Product #: 10]

W target(Mat-cn)Physical propertiesColorsilverDensity19.35g/m& 179Melting point3407Technical indicatorspurity99.95 PercentRelative density>99 PercentCut surface flatness3.2RaTolerance& 1770.1mmgrain sizeuniform

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Listing 1 to 25 of 36 result(s)
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